This comprehensive textbook titled “Optical and EUV Lithography: A Modeling Perspective” is a must-have for students and professionals interested in the subject area of photography. The book, published by Spie, covers the topic in-depth and provides a thorough understanding of the technology. With a length of 25.5 cm, height of 2.4 cm, and width of 17.8 cm, this trade paperback book has 374 pages and is written in English. The author, Andreas Erdmann, has expertise in the field and has provided a comprehensive guide to the subject. The book is part of the Press Monographs series and is a valuable resource for those interested in optical and EUV lithography.